Plasma Systems
RF plasma systems are the most widely used and versatile plasma
technology. This plasma technology is applied to a broad spectrum of
industrial, semiconductor and medical device applications.
Material surfaces that require cleaning, coating or chemical modification
are immersed into the energetic environment of an RF plasma. Although
they are subjected to chemically reactive species that are carried to their
surfaces by the directional effects of many RF plasma systems. These
directional effects can carry momentum under the right conditions. A
plasma system can physically remove more inert surface contaminants and
cross-linking polymers to lock the plasma treatment in place.
The plasma systems can be customized to meet a customers specific
application and through-put needs. The chamber, electrodes, power
generator and vacuum pumps are scaled based on the the size and shape
of the specific substrate to be processed. For example the generator
frequency can be in the ranges of 40 kHz, 100 kHz, 150 kHz, 13.56 MHz
with wattage’s from 1 to 2000 watts depending on the particular process
requirements.
PVA Tepla America brings significant experience in designing equipment.
With Proper engineering a RF plasma system can be designed to fit the
precise need of the application without adding unnecessary costs and can
usually meet the customers particular budget requirements.
PHOTORESIST ASHING
Plasma photoresist ashing following etching and ion implantation is one of the most
important and frequently performed steps in semiconductor…
