The Ion 40QPlasma System is a barrel type plasma reactor. It is designed for batchprocessing wafers for photoresist strip, descum, nitride etch and othercleaning applications in semiconductor, LED, and MEMS fabrication. The IoN 40Qtechnology is based on proven reactor designs developed by our company over 40years (International Plasma Corporation, Branson IPC, Dionex, Gasonics,Metroline, TePla and finally PVA TePla). Today’s IoN 40Q is designed to meetthe evolving demands of our customers, emphasizing versatility and control fortheir surface treatment needs. Its advanced features provide state of the artprocess control, fail-safe system alarms and data capturing software. Thisenables the system to meet stringent quality control programs required tomanufacture Semiconductor, LED and MEMS devices. The IoN 40Q uses radiofrequency (RF) generated plasma in a compact, fully integrated package
