Inline Plasma Treatment System
The ILHC (Inline High Capacity PECVD) is a continuous high speed vacuum plasma system.It offers full process control for plasma assisted chemical vapor deposition(PECVD), etching, cleaning and activation in a high production environment.
Gas plasma is the technology of choice for surface modification of materials in the life sciences, consumer electronic electronics, semiconductors and a variety of industrial components. This new and unique system design has moved plasma technology field to new level of performance and capability.
The ILHC (InlineHigh Capacity PECVD) was designed to meet high production flow requirements ofour customers. It provides fast process treatment times, excellent uniformity and precise thickness control. Its features provide state of the art process control, fail-safe systems with alarms and full data capturing and reporting software.
The ILHC(Inline High Capacity PECVD) uses radio frequency (RF) generated plasma combined with a unique conveyor system in a well laid out and fully integrated package. The design allows for easy installation and maintenance in production environments.
